Plasma-chemical deposition of anti-reflective and protective coating for infrared optics
Films of amorphous hydrogenated carbon doped with Si and O were deposited on samples of crystalline silicon by plasma chemical deposition in a mixture of polyphenylmethylsiloxane vapors and Ar. The physico-mechanical and optical properties of films for use as antireflection and protective coatings in IR optics devices were investigated. The transparency of the films in the 2.5-8 µm wavelength range was measured by Fourier transform infrared spectroscopy. The structure and composition of the films were studied by Raman and X-ray photoelectron spectroscopy. The hardness and other mechanical properties of the films were determined using nanoindentation. It is shown that the double-sided deposition of a-C:H:SiOx films on Si wafers makes it possible to increase their integral transmission in the wavelength range of 3-5 μm from 50 to 87%. In this case, the films have good adhesion, excellent mechanical characteristics, heat resistance in the temperature range from room temperature to 500°C and corrosion resistance to NaCl aqueous solution.
Keywords
антиотражающие покрытия,
защитные покрытия,
ИК-оптика,
плазмохимический синтез,
antireflection coatings,
protective coatings,
IR optics,
plasma-chemical synthesisAuthors
| Grenadyorov A.S. | Institute of High Current Electronics SB RAS | 1711Sasha@mail.ru |
| Oskomov K.V. | Institute of High Current Electronics SB RAS | oskomov@lae.hcei.tsc.ru |
| Solovyev A.A. | Institute of High Current Electronics SB RAS; National Research Tomsk Polytechnic University | andrewsol@mail.ru |
| Selivanova A.V. | Boreskov Institute of Catalysis | avselivano-va@catalysis.ru |
| Konishchev M.E. | National Research Tomsk Polytechnic University | mkonishchev@googlemail.com |
Всего: 5
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