Effect of plasma etching on optical breakdown threshold of nonlinear ZnGeP2 crystals in wavelength region ~ 2.1 μm
Studies of the effect of plasma cleaning of the surface on the optical stability of monocrystal ZnGeP2 were carried out. A change in the threshold of optical breakdown was established at various parameters of plasma cleaning of the surface of crystals. When a polished ZnGeP2 surface is exposed to low-temperature plasma in an atmosphere with an electron concentration of 1014-1015 cm-3 at a voltage of 13-20 kV and a pulse repetition rate of 50-100 Hz, a 30% increase in the optical breakdown threshold of samples is observed during 500 000 pulses with ~ 40 ns duration.
Keywords
optical breakdown,
ZnGeP2,
parametric light generatorsAuthors
Yudin Nikolai N. | Tomsk State University; LLC Laboratory of Optical Crystals | rach3@yandex.ru |
Sosnin Eduard A. | Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences | badik@loi.hcei.tsc.ru |
Beloplotov Dmitry V. | Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences | rff.qep.bdim@gmail.com |
Sorokin Dmitry A. | Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences | sdma-70@loi.hcei.tsc.ru |
Kuznetsov Vladimir S. | Tomsk State University; LLC Laboratory of Optical Crystals | robert_smith_93@mail.ru |
Antipov Oleg L. | Institute of Applied Physics of the Russian Academy of Sciences | antipov@ipfran.ru |
Slyunko Elena S. | Tomsk State University; LLC Laboratory of Optical Crystals | elenohka266@mail.ru |
Zinoviev Mikhail M. | Tomsk State University; LLC Laboratory of Optical Crystals | muxa9229@gmail.com |
Podzyvalov Sergey N. | Tomsk State University; LLC Laboratory of Optical Crystals | cginen@yandex.ru |
Kalsin Andrey Yu. | Tomsk State University; LLC Laboratory of Optical Crystals | andrejkalsin@gmail.com |
Gabdrakhmanov Akmal Sh. | Tomsk State University; LLC Laboratory of Optical Crystals | realist98937@mail.ru |
Lysenko Aleksey B. | Tomsk State University; LLC Laboratory of Optical Crystals | festality@yandex.ru |
Kulesh Maxim M. | Tomsk State University | dv472@mail.ru |
Всего: 13
References
Shay J.L., Wernick J.H. Ternary Chalcopyrite Semiconductors: Growth, Electronic Properties, and Applications. - N.Y.: Pergamon Press, 1975.
Парфенов В.А. Лазерная микрообработка материалов. - СПб.: СПбГЭТУ «ЛЭТИ», 2011. - 59 с.
Бобровников С.М., Матвиенко Г.Г., Романовский О.А. и др. Лидарный спектроскопический газоанализ атмосферы. - Томск: ИОА СО РАН, 2014. - 510 с.
Romanovskii O.A., Sadovnikov S.A., Kharchenko O.V., Yakovlev S.V. // Opt. Laser Technol. - 2019. - V. 116. - P. 43-47.
Bochkovskii D.A., Matvienko G.G., Romanovskii O.A., et al. // Atmospher. Ocean. Opt. - 2012. - V. 25. - No. 2. - P. 166-170.
Солдатов А.Н., Васильева А.В., Полунин Ю.П. и др. // Биотехносфера. - 2012. - № 3-4. - С. 47-51.
Kozub J., Ivanov B., Jayasinghe A., et al. // Biomed. Opt. Express. - 2011. - V. 2. - No. 5. - P. 1275-1281.
Аполлонов В.В., Грибенюков А.И., Короткова В.В. и др. // Квантовая электроника. - 1996. - Т. 23. - № 6. - С. 483-484.
Schunemann P.G., Zawilski K.T., Pomeranz L.A., et al. // J. Opt. Soc. Am. B. - 2016. - V. 33. - No. 11. - P. D36-D43.
Hemming A., Richards J., Davidson A.A., et al. // Opt. Express. - 2013. - V. 21. - No. 8. - P. 10062-10069.
Haakestad M.W., Fonnum H., Lippert E. // Opt. Express. - 2014. - V. 22. - No. 7. - P. 8556-8564.
Qian C., Yao B., Zhao B., et al. // Opt. Lett. - 2019. - V. 44. - No. 21. - P. 5262-5265.
Блумберген Н. // Прикладная оптика. - 1973. - Т. 12. - С. 661-664.
Фейт М., Рубенчик А.М. // Proc. SPIE. - 2004. - Т. 5273. - С. 264-272.
Gerhard C., Stappenbeck M. // Appl. Sci. - 2018. - V. 8. - P. 1556.
Liao D., Chen X., Tang C., et al. // Ceram.Int. - 2014. - V. 40. - P. 4479-4483.
Camp D.W., Kozlowski M.R., Sheehan L.M., et al. // Proc. SPIE. - 1998. - V. 3244. - P. 356-364.
Kozlowski M.R., Carr J., Hutcheon I.D., et al. // Proc. SPIE. - 1998. - V. 3244. - P. 365-375.
Bude J., Miller P., Baxamusa S., et al. // Opt. Express. - 2014. - V. 22. - P. 5839-5851.
Giuliano C.R. // Appl. Phys. Lett. - 1972. - V. 21. - P. 39-41.
Cheng X., Miao X., Wang H., et al. // Adv. Cond. Matter Phys. - 2014. - P. 974245.
Temple P.A., Lowdermilk W.H., Milam D. // Appl. Opt. - 1982. - V. 21. - P. 3249-3255.
Окунев А.О., Верозубова Г.А., Сташенко В.А., Янг Ч. // Вестник Новгородского государственного университета. - 2013. - Т. 1. - № 75. - С. 120-124.
Xu S., Zheng W., Yuan X., et al. // Nucl. Instrum. Methods Phys. Res. Sect. B. - 2008. - V. 266. - P. 3370-3374.
Liu H., Ye X., Zhou X., et al. // Opt. Mater. - 2014. - V. 36. - P. 855-860.
Juškevicius K., Buzelis R., Abromavicius G., et al. // Opt. Mater. Express. - 2017. - V. 7. - P. 3598-3607.
Yudin N., Zinoviev M., Kuznetsov V., et al. // Crystals. - 2023. - V. 13. - P. 440.
Юдин Н.Н., Антипов О.Л., Грибенюков А.И. и др. // Квант. электрон. - 2021. - Т. 51. - № 4. - С. 306-316.
Blunt L., Jiang X. Advanced Techniques for Assessment Surface Topography: Development of a Basis for 3D Surface Texture Standards «Surfstand». - London: Kogan Page Science, 2003.
ISO 25178-2:2012 Geometrical Product Specifications (GPS) - Surface Texture: Areal - Part 2: Terms, Definitions and Surface Texture Parameters.
ASME B46.1-2009 Surface Texture (Surface Roughness, Waviness, and Lay). - American National Standard.