Packet-pulse dual magnetron sputtering

The paper presents the results of an experimental study of the discharge formed by a dual (DU) magnetron sputtering system (MMS) with aluminum targets in the mode of packet-pulse magnetron sputtering of high power (in foreign literature - deep oscillation magnetron sputtering, DOMS). A feature of the discharge in the mode of DOMS is the use of a unipolar sequence of micropulses short duration and high power, which form microimpulse duration 1000 ÷ 3000 µs. Previously, this mode of sputtering used only in single MSS. In this paper, the DOMS mode was first investigated with a dual magnetron sputtering system. The main plasma parameters were measured using triple and single Langmuir probes. The dependence of plasma parameters on the parameters of pulsed discharge power supply: voltage and current amplitudes, current density and power density on the target surface is established. The results of the experiments showed that the use of dual packet-pulse magnetron sputtering can significantly increase the plasma concentration and the ion current density on the substrate in comparison with the traditional DC and MF modes of magnetron sputtering. The ratio of the ion flux density to the flux density of neutral atoms, characterizing the degree of ion bombardment of the growing coating in the DU DOMS mode reached a value of 0.28, whereas in the DC mode it was 0.008.

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