Plasma-chemical synthesis of amorphous hydrocarbon films doped by silicon, oxygen and nitrogen
In this work, amorphous hydrocarbon (a-C:H) films doped with Si, O, and N were obtained and studied. Films were deposited on samples of crystalline silicon by plasma chemical deposition in a mixture of polyphenylmethylsiloxane vapor, argon, and nitrogen. The effect of nitrogen content in films on their physico-mechanical properties is investigated. The composition of the films was studied by X-ray fluorescence spectroscopy and Fourier-transform infrared spectroscopy. The structure of the films was studied using Raman spectroscopy. Hardness and other mechanical properties of the films were determined using nanoindentation. It is shown that the chemical composition and properties of a-C:H:SiOx:N films can be controlled by changing the partial pressure of nitrogen during the deposition process. An increase in the nitrogen content in a-C:H:SiOx:N film leads to an increase in its root-mean-square roughness and wetting angle with water. It is also accompanied by a decrease in the carbon content in the film and a decrease in its hardness, due to a decrease in the content of the sp3-phase of carbon.
Keywords
Raman spectroscopy,
Fourier-transform infrared spectroscopy,
doped amorphous carbon,
plasma-chemical synthesis,
фурье-ИК-спектроскопия,
рамановская спектроскопия,
легированный аморфный углерод,
плазмохимический синтезAuthors
| Grenadyorov A.S. | Institute of High Current Electronics SB RAS | 1711Sasha@mail.ru |
| Oskomov K.V. | Institute of High Current Electronics SB RAS | oskomov@lae.hcei.tsc.ru |
| Solovyev A.A. | Institute of High Current Electronics SB RAS | andrewsol@mail.ru |
| Ivanova N.M. | National Research Tomsk Polytechnic University | nmi2@tpu.ru |
| Sypchenko V.S. | National Research Tomsk Polytechnic University | sypchenko@tpu.ru |
Всего: 5
References
Yan X., Xu T., Chen G., et al. // Appl. Phys. A. - 2005. - V. 81. - P. 41-46.
Ferrari А.С. and Robertson J. // Phys. Rev. B. - 2000. - V. 61. - No. 20. - P. 14095-14107.
Bhattacherjee S., Niakan H., Yang Q., et al. // Surf. Coat. Tech. - 2015. - V. 284. - No. 12. - P. 153-158.
Yan X.B., Xu T., Yue S.S., et al. // Diam. Relat. Mater. - 2005. - V. 14. - P. 1342-1347.
Ye P., Xu F., Wu J., et al. // Surf. Coat. Tech. - 2017. - V. 320. - P. 183-189.
Shtansky D.V., Kulinich S.A., Levashov E.A., et al. // Thin Solid Films. - 2002. - V. 420- 421. - P. 330-337.
Nakayama M., Tsuyoshi A., and Shibahara M. // J. Vac. Sci. Technol. A. - 1995. - V. 13. - P. 195- 199.
Oliver W.C. and Pharr G.M.// J. Mater. Res. - 2004. - V. 19. - P. 3-20.
Grenadyorov A.S., Solovyev А.А., Oskomov K.V., et al. // Thin Solid Films. - 2019. - V. 669. - P. 253-261.
Grenadyorov A.S., Solovyev А.А., Oskomov K.V., and Sypchenko V.S. // Surf. Coat. Technol. - 2018. - V. 349. - P. 547-555.
Fainer N.I., Plekhanov A.G., Maksimovsky E.A., and Rumyantsev Yu.M. // Glass Phys. Chem. - 2018. - V. 44. - No. 6. - P. 607-615.
Fainer N.I., Plekhanov A.G., Rumyantsev Yu.M., et al. // Glass Phys. Chem. - 2014. - V. 40. - No. 6. - P. 643-649.
Tamulevičienė A., Kopustinskas V., Niaura G., et al. // Thin Solid Films. - 2015. - V. 581. - P. 86-91.
Fainer N.I., Plekhanov A.G., Rumyantsev Yu.M., et al. // Glass Phys. Chem. - 2014. - V. 40. - No. 5. - P. 570-577.
Sevast’yanov V.I. and Vasilets V.N. // Russ. J. Gen. Chem. - 2009. - V. 79. - P. 596-605.
Kolpakov A.Ya., Sudzhanskaya I.V., Galkina M.E., et al. // Nanotechnologies in Russia. - 2011. - V. 6. - No. 3-4. - P. 185-188.
Veerasamy V.S., Yuan J., Amaratunga G.A., et al. // Phys. Rev. B. Condens. Matter. - 1993. - V. 48. - No. 24. - P. 17954-17959.
Ermakova E., Rumyantsev Y., Shugurov A., et al. // Appl. Surf. Sci. - 2015. - V. 339. - P. 102- 108.
Robertson J. // Mater. Sci. Eng. R. Rep. - 2002. - V. 37. - P. 129-281.
Kleinsorge B., Ferrari A.C., and Robertson J. // J. Appl. Phys. - 2000. - V. 88. - P. 1149-1157.
Bulou S., Le Brizoual L., Miska P., et al. // Thin Solid Films. - 2011. - V. 520. - P. 245-250.
Nakao S., Kinomura A., and Sonoda T. // Nucl. Instrum. Methods. B. - 2013. - V. 307. - P. 333-339.
Damasceno J.C. and Camargo S.S. // Thin Solid Films. - 2008. - V. 516. - P. 1890-1897.
Zavedeev E.V., Zilova O.S., Shupegin M.L., et al. // Appl. Phys. A Mater. Sci. Process. - 2016. - V. 122. - No. 11. - Art. 961.
Oguri K. and Arai T. // J. Mater. Res. - 1990. - V. 5. - P. 2567-2571.
Ikeyama M. and Sonoda T. // Nucl. Instrum. Methods Phys. Res. B. - 2013. - V. 307. - P. 340-343.
Camargo S.S., Santos R.A., Baia Neto A.L., et al. // Thin Solid Films. - 1998. - V. 332. - P. 130-135.
Mort J., Machonkin M.A., and Okumura K. // Appl. Phys. Lett. - 1991. - V. 59. - No. 24. - P. 3148-3150.
Gorshunov B.P., Shupegin M.L., Ivanov V.Y., et al. // Tech. Phys. - 2008. - V. 53. - No. 5. - P. 641-645.
Zhigalina O.M., Khmelenin D.N., Pimenov S.M., et al. // Crystallography Rep. - 2018. - V. 63. - No. 5. - P. 796-801.
