Investigation of the generation of ion beams in a vacuum arc ion source with a multicomponent cathode
Vacuum arc ion sources are widely used in modifying the properties of various surfaces using ion implantation. The use of cathodes consisting of multicomponent compounds in such sources makes it possible to obtain beams of complex composition, which expands their technological capabilities. The paper presents studies of an ion beam generated in a vacuum arc ion source with a two-component cathode made of a copper-chromium composite when a magnetic field is applied to the discharge gap. It is shown that the distribution of the charge states of copper and chromium ions in the beam depends on their ratio in the cathode material, and the fractions of these ions in the beam correspond to their atomic content in the cathode. It is shown that the ratio of copper and chromium ions in the plasma, and, accordingly, in the ion beam, is independent of the magnetic field and corresponds to the ratio of the atoms of these elements in the cathode.
Keywords
Authors
| Frolova V.P. | Institute of High Current Electronics SB RAS; Tomsk State University of Control Systems and Radioelectronics | frolova_valeria_90@mail.ru |
| Nikolaev A.G. | Institute of High Current Electronics SB RAS | nik@opee.hcei.tsc.ru |
| Yushkov G.Y.U. | Institute of High Current Electronics SB RAS | gyushkov@mail.ru |
| Kiziridi P.P. | Institute of High Current Electronics SB RAS | kiziridi_pavel@mail.ru |
| Prokopenko N.A. | Institute of High Current Electronics SB RAS | nick08_phantom@mail.ru |
Всего: 5
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