Deposition of the α-Al2O3 coatings by reactiveevaporation with intensive ion assistance under 500-550 °C
The results of investigation of synthesis conditions and structure of the α phase in A2O3 coatings deposited by reactive anodic evaporation in an arc discharge at low temperature (500-550 °C) are presented. The current density of ion assistance (up to 20 mA/cm2) and the ions energy (25-150 eV) were varied in the experiments at a constant deposition rate of 3 μm/h. The phase composition of the coating was analyzed by x-ray diffraction and infrared spectroscopy. It was shown that the α phase is formed when the threshold bias voltage of 75-100 V is reached and is stable in a limited range of ion energy, the growth of which leads to a decrease in the size of α phase nanocrystallites and coating amorphization. A feature of the coating structure is the preferential orientation (300), the most probable reason for the dominance of which is the growth of the α phase when the orientation relation (440) γ-Al2O3/(300) α-Al2O3 is satisfied.
Keywords
Authors
| Kamenetskikh A.S. | Institute of Electrophysics UB RAS | alx@iep.uran.ru |
| Gavrilov N.V. | Institute of Electrophysics UB RAS | gavrilov@iep.uran.ru |
| Tretnikov P.V. | Institute of Electrophysics UB RAS | tpetr@iep.uran.ru |
| Chukin A.V. | Ural Federal University named after the First President of Russia B.N. Yeltsin | achukin@mail.ru |
| Menshakov A.I. | Institute of Electrophysics UB RAS | menshakovandrey@mail.ru |
| Cholakh S.O. | Ural Federal University named after the First President of Russia B.N. Yeltsin | s.o.cholakh@urfu.ru |
Всего: 6
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