Structure and properties of multi-layer films of high-entropy alloys deposited by ion-plasma method
Method of high-entropy alloys (HEAs) film formation is considered. It consists in film deposition on substrate in vacuum from multicomponent gas-metal plasma generated by simultaneous independent vacuum-arc evaporation of cathodes of selected elements in the mode of plasma assistance. It is shown that the variation of discharge current of electric arc evaporators allows to vary the element composition of HEAs films within the wide ranges. It was found that the formed films are single-phase materials with a body-centered cubic lattice (bcc). Its parameter varies from 0.31661 to 0.31959 nm and naturally depends on the elements concentration in the alloy. The HEAs films have a nanocrystalline structure; the coherent scattering regions (CSR) vary from 15.1 to 25.2 nm. The films microhardness depends on the concentration of chemical elements and varies from 13.0 to 15.0 GPa.
Keywords
high-entropy alloys,
HEAs films,
vacuum-arc plasma-assisted method,
deposition,
phase composition,
structure,
hardness,
wear resistanceAuthors
| Ivanov Yu.F. | Institute of High Current Electronics SB RAS | yufi55@mail.ru |
| Koval N.N. | Institute of High Current Electronics SB RAS | koval@opee.hcei.tsc.ru |
| Akhmadeev YU.H. | Institute of High Current Electronics SB RAS | ahmadeev@opee.hcei.tsc.ru |
| Uglov V.V. | Belarusian State University | uglov@bsu.by |
| Shugurov V.V. | Institute of High Current Electronics SB RAS | shugurov@opee.hcei.tsc.ru |
| Petrikova E.A. | Institute of High Current Electronics SB RAS | elizmarkova@yahoo.com |
| Krysina O.V. | Institute of High Current Electronics SB RAS | krysina@opee.hcei.tsc.ru |
| Prokopenko N.A. | Institute of High Current Electronics SB RAS | nick08_phantom@mail.ru |
| Azhazha I.I. | Tomsk State University of Control Systems and Radioelectronics | azhazha2005@mail.ru |
Всего: 9
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